Analytical expression for impact of linewidth roughness on critical dimension uniformity

Author:

Mack Chris A.

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 27 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. 极紫外光刻中的边缘放置误差控制;Chinese Journal of Lasers;2024

2. E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-17

3. Overlay and edge placement error metrology in the era of stochastics;Metrology, Inspection, and Process Control XXXVII;2023-04-27

4. Metrology;2021 IEEE International Roadmap for Devices and Systems Outbriefs;2021-11

5. Diffuse scattering due to stochastic disturbances of 1D-gratings on the example of line edge roughness;Optics Express;2018-10-12

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