Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow-Reference-Cited by-同舟云学术

Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Published:2015-03-19 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies VII
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Author:

Pathangi Hari,Chan Boon Teik,Bayana Hareen,Vandenbroeck Nadia,Van Den Heuvel Dieter,Van Look Lieve,Rincon-Delgadillo Paulina,Cao Yi,Kim JiHoon,Lin Guanyang,Parnell Doni,Nafus Kathleen,Harukawa Ryota,Chikashi Ito,Nagaswami Venkat,D'Urzo Lucia,Gronheid Roel,Nealey Paul

Publisher

SPIE

Reference6 articles.

1. Self-assembling materials for lithographic patterning: overview, status, and moving forward;Hinsberg,2010

2. Block copolymer directed self-assembly enables sublithographic patterning for device fabrication;Wong,2012

3. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

4. Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow;Gronheid,2014

5. Defect source analysis of directed self-assembly process (DSA of DSA);Rincon,2013

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