Monitoring reticle molecular contamination in ASML EUV Alpha Demo Tool-Reference-Cited by-同舟云学术

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Monitoring reticle molecular contamination in ASML EUV Alpha Demo Tool

Published:2010-03-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Okoroanyanwu Uzodinma,Jiang Aiqin,Dittmar Kornelia,Fahr Torsten,Laursen Thomas,Wood Obert,Cummings Kevin,Holfeld Christian,Peters Jan-Hendrik,Gullikson Eric,La Fontaine Bruno

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study of EUV reticle storage effects through exposure on EBL2 and NXE;Extreme Ultraviolet Lithography 2020;2020-11-04

2. Towards the optical inspection sensitivity optimization of EUV masks and EUVL-exposed wafers;SPIE Proceedings;2012-04-16

3. Evaluation of extreme ultraviolet mask defect using blank inspection, patterned mask inspection, and wafer inspection;Journal of Micro/Nanolithography, MEMS, and MOEMS;2011-10-01

4. A simple modeling of carbon contamination on EUV exposure tools based on contamination experiments with synchrotron source;SPIE Proceedings;2011-03-17

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