Extreme-ultraviolet light source development to enable pre-production mask inspection-Reference-Cited by-同舟云学术

Extreme-ultraviolet light source development to enable pre-production mask inspection

Published:2012-05-21 Issue:2 Volume:11 Page:021105-1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Partlow Matthew J.,Besen Matthew M.,Blackborow Paul A.,Collins Ron,Gustafson Deborah,Horne Stephen F.,Smith Donald K.

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference25 articles.

1. Smith, D. et al., “Inductively-driven plasma light source,” U.S. Patent No. 7,307,375 (2007).

2. Development of actinic full-field EUV mask blank inspection tool at MIRAI-Selete

3. Actinic phase defect detection and printability analysis for patterned EUVL mask

4. Evaluation of EUV mask defect using blank inspection, patterned mask inspection, and wafer inspection

5. AIMS EUV: the actinic aerial image review platform for EUV masks

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