Author:
Terasawa Tsuneo,Yamane Takeshi,Tanaka Toshihiko,Suga Osamu,Kamo Takashi,Mori Ichiro
Cited by
26 articles.
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1. Source performance metrics for EUV mask inspection;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-03-08
2. Defect recognition in line-space patterns aided by deep learning with data augmentation;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-09-24
3. Variation in phase defect size on extreme ultraviolet mask before and after reflective multilayer coating;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-11
4. Measurement of the phase defect size using a scanning probe microscope and at-wavelength inspection tool;Journal of Micro/Nanolithography, MEMS, and MOEMS;2015-08-21
5. Measurement of the phase defect size using scanning probe microscope and at-wavelength inspection tool;SPIE Proceedings;2015-03-13