Measurement of the phase defect size using scanning probe microscope and at-wavelength inspection tool-Reference-Cited by-同舟云学术

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Measurement of the phase defect size using scanning probe microscope and at-wavelength inspection tool

Published:2015-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Amano Tsuyoshi,Abe Tsukasa

Publisher

SPIE

Reference30 articles.

1. Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance;Dietze,2011

2. Evaluation of the contamination removal capability and multilayer degradation in various cleaning methods;Takagi,2010

3. Improvement of total quality on EUV mask blanks toward volume production;Shoki,2010

4. Mask technology of extreme-ultraviolet lithography;Kinoshita,1998

5. Impact of EUV mask roughness on lithography performance;Arisawa,2013

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ta-Ni Compound EUV Absorber Material to Mitigate Shadowing Effect and Improve Chemical Durability;Korean Journal of Metals and Materials;2016-07-05

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