XUV metrology: surface analysis with extreme ultraviolet radiation-Reference-Cited by-同舟云学术

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XUV metrology: surface analysis with extreme ultraviolet radiation

Published:2009-05-07 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Banyay M.,Juschkin L.,Bücker T.,Loosen P.,Bayer A.,Barkusky F.,Döring S.,Peth C.,Mann K.,Blaschke H.,Balasa I.,Ristau D.

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry;Thin Solid Films;2019-06

2. Spatially Resolved Spectroscopic Extreme Ultraviolet Reflectometry for Laboratory Applications;Journal of Nanoscience and Nanotechnology;2019-01-01

3. Cross characterization of ultrathin interlayers in HfO2 high-k stacks by angle resolved x-ray photoelectron spectroscopy, medium energy ion scattering, and grazing incidence extreme ultraviolet reflectometry;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-07

4. Impact of SiO 2 and CaF 2 surface composition on the absolute absorption at 193nm;SPIE Proceedings;2011-10-05

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