Cross characterization of ultrathin interlayers in HfO2 high-k stacks by angle resolved x-ray photoelectron spectroscopy, medium energy ion scattering, and grazing incidence extreme ultraviolet reflectometry-Reference-Cited by-同舟云学术

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Cross characterization of ultrathin interlayers in HfO2 high-k stacks by angle resolved x-ray photoelectron spectroscopy, medium energy ion scattering, and grazing incidence extreme ultraviolet reflectometry

Published:2012-07 Issue:4 Volume:30 Page:041506
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Banyay Matus,Juschkin Larissa,Bersch Eric,Franca Daniel,Liehr Michael,Diebold Alain

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4718433

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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3. Characterization of nanoscale gratings by spectroscopic reflectometry in the extreme ultraviolet with a stand-alone setup;Optics Express;2020-06-25

4. Proximity-induced ferromagnetism and chemical reactivity in few-layer VSe2 heterostructures;Physical Review B;2020-01-08

5. Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry;Thin Solid Films;2019-06

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