Phase-shift mask in EUV lithography
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SPIE
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-05-11
2. Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-08-11
3. Attenuated PSM for EUV: Can they mitigate 3D mask effects?;Extreme Ultraviolet (EUV) Lithography IX;2018-03-19
4. Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography;Advanced Optical Technologies;2017-01-01
5. Optical and EUV projection lithography: A computational view;Microelectronic Engineering;2015-01
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