20:1 projection soft x-ray lithography using trilevel resist-Reference-Cited by-同舟云学术

20:1 projection soft x-ray lithography using trilevel resist

Published:1990-05-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Jewell Tanya E.¹,Becker M. M.¹,Bjorkholm John E.¹,Bokor Jeffrey²,Eichner Ludwig¹,Freeman Richard R.¹,Mansfield William M.¹,MacDowell Alastair A.³,O'Malley M. L.¹,Raab Eric L.¹,Silfvast William T.¹,Szeto L. H.¹,Tennant Donald M.¹,Waskiewicz Warren K.¹,White Donald L.¹,Windt David L.⁴,Wood II Obert R.¹,Bruning John H.⁵

Affiliation:

1. AT&T Bell Labs. (USA)

2. Lawrence Berkeley National Lab. and Univ. of California/Berkeley (USA)

3. Brookhaven National Lab. (USA)

4. AT&T Bell Labs. and Univ. of M (USA)

5. GCA Corp. (USA)

Publisher

SPIE

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