Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography-Reference-Cited by-同舟云学术

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Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography

Published:1999 Issue:6 Volume:17 Page:2970
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Cardinale G. F.,Henderson C. C.,Goldsmith J. E. M.,Mangat P. J. S.,Cobb J.,Hector S. D.

Publisher

American Vacuum Society

Subject

General Engineering

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