Author:
Smith Bruce W.,Bourov Anatoly,Fan Yongfa,Cropanese Frank,Hammond Peter
Cited by
16 articles.
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1. Evanescent-coupled antireflection coatings for hyper-numerical aperture immersion lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2014-11
2. Solid immersion interference lithography with conformable phase mask;Microelectronic Engineering;2014-07
3. A detailed study of resonance-assisted evanescent interference lithography to create high aspect ratio, super-resolved structures;Optics Express;2013-05-31
4. Aqueous developable dual switching photoresists for nanolithography;Journal of Polymer Science Part A: Polymer Chemistry;2012-07-16
5. Photopatternable inorganic hardmask;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11