Aqueous developable dual switching photoresists for nanolithography-Reference-Cited by-同舟云学术

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Aqueous developable dual switching photoresists for nanolithography

Published:2012-07-16 Issue:20 Volume:50 Page:4255-4265
ISSN:0887-624X
Container-title:Journal of Polymer Science Part A: Polymer Chemistry
language:en
Short-container-title:J. Polym. Sci. A Polym. Chem.

Author:

Chen Lan,Goh Yong Keng,Cheng Han Hao,Smith Bruce W.,Xie Peng,Montgomery Warren,Whittaker Andrew K.,Blakey Idriss

Publisher

Wiley

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pola.26232/fullpdf

Reference80 articles.

1. Lithography, metrology and nanomanufacturing

2. Mask writing time explosion and its effect on CD control in e-beam lithography

3. Emerging fabrication techniques for 3D nano-structuring in plasmonics and single molecule studies

4. Microfluidics for Synthetic Biology

5. TiO2–ZrO2 affinity chromatography polymeric microchip for phosphopeptide enrichment and separation

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