Evanescent-coupled antireflection coatings for hyper-numerical aperture immersion lithography-Reference-Cited by-同舟云学术

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Evanescent-coupled antireflection coatings for hyper-numerical aperture immersion lithography

Published:2014-11 Issue:6 Volume:32 Page:06FE03
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Bourke Levi,Blaikie Richard J.

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4900726

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical colorimetric LiTaO₃ wafers for high-precision lithography on frequency control of SAW devices;Photonics Research;2024-02-01

2. Tunable reflection coating to reduce exposure power threshold for interference-assisted two-photon polymerization lithography;Applied Physics Express;2023-09-01

3. Experimental demonstration of evanescent-coupled antireflection coatings;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2018-01

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