1. Fundamental Investigation of Negative Tone Development (NTD) for the 22nm node (and beyond);Landie,2011
2. SMO and NTD for Robust Single Exposure Solution on Contact Patterning for 40nm Node Flash Memory Devices;Yu*,2013
3. The Studies of SMO Process on Cont Layer of 20nm Node;Lo,2013
4. Study and Comparison of Negative Tone Resists for Fabrication of Bright Field Masks for 14 nm Node;Zweber,2012
5. Process Enhancements for Negative Tone Development;Noya,2013