CP element based design for 14nm node EBDW high volume manufacturing-Reference-Cited by-同舟云学术

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CP element based design for 14nm node EBDW high volume manufacturing

Published:2012-03-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies IV
language:
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Author:

Maruyama Takashi,Machida Yasuhide,Sugatani Shinji,Takita Hiroshi,Hoshino Hiromi,Hino Toshio,Ito Masaru,Yamada Akio,Iizuka Tetsuya,Komatsu Satoshi,Ikeda Makoto,Asada Kunihiro

Publisher

SPIE

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Direct-write crosslinking in vacuum-deposited small-molecule films using focussed ion and electron beams;Nanotechnology;2019-05-21

2. Two-Stage Layout Decomposition for Hybrid E-Beam and Triple Patterning Lithography;ACM Transactions on Design Automation of Electronic Systems;2017-10-17

3. Row-structure stencil planning approaches for E-beam lithography with overlapped characters;Integration;2016-09

4. Design for Manufacturability with E-Beam Lithography;Design for Manufacturability with Advanced Lithography;2016

5. Flexible Packed Stencil Design With Multiple Shaping Apertures and Overlapping Shots for E-beam Lithography;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2015-10

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