Design for Manufacturability with E-Beam Lithography
Author:
Publisher
Springer International Publishing
Link
http://link.springer.com/content/pdf/10.1007/978-3-319-20385-0_5
Reference65 articles.
1. Kahng, A.B., Park, C.-H., Xu, X., Yao, H.: Layout decomposition for double patterning lithography. In: IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 465–472 (2008)
2. Zhang, H., Du, Y., Wong, M.D., Topaloglu, R.: Self-aligned double patterning decomposition for overlay minimization and hot spot detection. In: ACM/IEEE Design Automation Conference (DAC), pp. 71–76 (2011)
3. Yu, B., Yuan, K., Zhang, B., Ding, D., Pan, D.Z.: Layout decomposition for triple patterning lithography. In: IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 1–8 (2011)
4. Yu, B., Pan, D.Z.: Layout decomposition for quadruple patterning lithography and beyond. In: ACM/IEEE Design Automation Conference (DAC), pp. 53:1–53:6 (2014)
5. Pan, D.Z., Yu, B., Gao, J.-R.: Design for manufacturing with emerging nanolithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 32(10), 1453–1472 (2013)
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