Row-structure stencil planning approaches for E-beam lithography with overlapped characters
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Software
Reference21 articles.
1. J. Kuang, E.F.Y. Young, A highly-efficient row-structure stencil planning approach for e-beam lithography with overlapped characters, in: Proceedings of International Symposium on Physical Design, 2014.
2. H. Zhang, Y. Du, M.D.F. Wong, Y. Deng, P. Mangat, Layout small-angle rotation and shift for EUV defect mitigation, in: Proceedings of International Conference on Computer-Aided Design, 2012.
3. T. Harzendorf, F. Fuchs, M. Banasch, U.D. Zeitner, Fast character projection electron beam lithography for diffractive optical elements, in: Proceedings of SPIE 9130, Micro-Optics, 2014.
4. R. Ikeno et al., A structured routing architecture and its design methodology suitable for high-throughput electron beam direct writing with character projection, in: Proceedings of International Symposium on Physical Design, 2013.
5. T. Maruyama et al. Cp element based design for 14nm node EBDW high volume manufacturing, in: Proceedings of SPIE 8323, Alternative Lithographic Technologies IV, 2012.
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