Performance of a step-and-scan system for DUV lithography-Reference-Cited by-同舟云学术

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Performance of a step-and-scan system for DUV lithography

Published:1997-07-07 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

de Zwart Gerard,van den Brink Martin A.,George Richard A.,Satriasaputra Danu,Baselmans Jan,Butler H.,van Schoot Jan B.,de Klerk Jos

Publisher

SPIE

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Exposure Tool Development Toward Advanced EUV Lithography: A Journey of 40 Years Driving Moore’s Law;IEEE Electron Devices Magazine;2024-03

2. Investigation of the Dynamics of a 2-DoF Actuation Unit Cell for a Cooperative Electrostatic Actuation System;Actuators;2021-10-18

3. Synchronization control based on phase compensation of tracking error of wafer and reticle stage in step and scan lithographic equipment;International Conference on Optoelectronic and Microelectronic Technology and Application;2020-12-04

4. Characterization of EUV image fading induced by overlay corrections using pattern shift response metrology;International Conference on Extreme Ultraviolet Lithography 2019;2019-10-03

5. A design of energy detector for ArF excimer lasers;UV and Higher Energy Photonics: From Materials to Applications 2017;2017-08-29

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