100W EUV light-source key component technology update for HVM-Reference-Cited by-同舟云学术

100W EUV light-source key component technology update for HVM

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography VII
language:
Short-container-title:

Author:

Hori Tsukasa¹,Kawasuji Yasufumi¹,Tanaka Hiroshi¹,Watanabe Yukio¹,Shiraishi Yutaka¹,Abe Tamotsu¹,Okamoto Takeshi¹,Kodama Takeshi¹,Nakarai Hiroaki¹,Yamazaki Taku¹,Okazaki Shinji¹,Saitou Takashi¹,Mizoguchi Hakaru¹

Affiliation:

1. Gigaphoton Inc. (Japan)

Publisher

SPIE

Reference20 articles.

1. Immersion lithography and its impact on semiconductor manufacturing;Lin,2004

2. Lessons learnt on Sn DPP sources in Alpha tool and the road to HVM;Corthout,2007

3. VUV~UV light generation and application (in Japanese);Morimoto,2010

4. Tin LDP Source Collector Module (SoCoMo) ready for integration into Beta scanner;Yoshioka,2011

5. First generation laser-produced plasma source system for HVM EUV lithography;Mizoguchi,2010

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Numerical simulation of laser-produced plasma expansion on a droplet surface;Scientific Reports;2023-03-11

2. Generation of the small tin-droplet streams with a manipulable droplet spacing via the forced velocity perturbation;Physics of Fluids;2023-01-01

3. Numerical study of continuous liquid tin jet breakup and satellite droplet formation;AIP Advances;2022-12-01

4. Influence of transverse magnetic field on dynamics of Sn plasma produced by CO2 laser;Physica B: Condensed Matter;2021-02

5. Surface morphology change of protective film on collector mirror related to implantation of Sn emitted from laser produced plasma in EUV light source;Applied Physics Express;2020-10-15