Integration and automation of DoseMapper in a logic fab APC system: application for 45/40/28nm node

Author:

Le Gratiet Bertrand,Salagnon Christophe,de Caunes Jean,Mikolajczak Marc,Morin Vincent,Chojnowski Nicolas,Sundermann Frank,Massin Jean,Pelletier Alice,Metz Joel,Blancquaert Yoann,Bouyssou Regis,Pelissier Arthur,Belmont Olivier,Strapazzon Anne,Phillips Anna,Devoivre Thierry,Bernard Emilie,Batail Estelle,Thevenon Lionel,Bry Benedicte,Bernard-Granger Fabrice,Oumina Ahmed,Baron Marie-Pierre,Gueze Didier

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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3. Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology;SPIE Proceedings;2017-03-28

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5. Patterning critical dimension control for advanced logic nodes;Journal of Micro/Nanolithography, MEMS, and MOEMS;2015-04-10

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