Advanced metrology by offline SEM data processing-Reference-Cited by-同舟云学术

Advanced metrology by offline SEM data processing

Published:2017-09-28 Issue: Volume: Page:
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Container-title:33rd European Mask and Lithography Conference
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Author:

Lakcher Amine,Ducoté Julien,Farys Vincent,Schneider Loïc,Le-Gratiet Bertrand,Besacier Maxime

Publisher

SPIE

Reference17 articles.

1. Challenge to New Metrology World by CD-SEM and Design;Shunzuke;Hitachi Review,2008

2. Translation of lithography variability into after-etch performance: monitoring of golden hotspot;Jo,2016

3. Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology;Amine;Metrology, Inspection, and Process Control for Microlithography XXXI,2017

4. Framework for SEM contour analysis;Loïc;Metrology, Inspection, and Process Control for Microlithography XXXI,2017

5. Integration and automation of DoseMapper in a logic Fab APC system: application for 45/40/28nm node;Bertrand;Metrology, Inspection and Process Control for Microlithography XXVI,2012

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1. CD-SEM Contour Extraction for Complex Features Measurement;2022 China Semiconductor Technology International Conference (CSTIC);2022-06-20

2. Contour based metrology: “make measurable what is not so";Metrology, Inspection, and Process Control for Microlithography XXXIV;2020-03-27

3. Contour based metrology: getting more from a SEM image;Metrology, Inspection, and Process Control for Microlithography XXXIII;2019-03-26

4. Investigating process variability at ppm level using advanced massive eBeam CD metrology and contour analysis;Metrology, Inspection, and Process Control for Microlithography XXXIII;2019-03-26