Effects of wafer noise on the detection of 20-nm defects using optical volumetric inspection-Reference-Cited by-同舟云学术

Effects of wafer noise on the detection of 20-nm defects using optical volumetric inspection

Published:2015-02-11 Issue:1 Volume:14 Page:014001
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Barnes Bryan M.,Goasmat Francois,Sohn Martin Y.,Zhou Hui,Vladár András E.,Silver Richard M.

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. 2012 tables, Yield enhancement,2014

2. Defect metrology challenges at the 11-nm node and beyond

3. Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus

4. Three-dimensional deep sub-wavelength defect detection using λ = 193 nm optical microscopy

5. Wafer noise models for defect inspection

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