Author:
Shimazu Nobuo,Watanabe Takashi,Morosawa Tetsuo,Morita Hirofumi,Kuriyama Youichi,Kunioka Tatsuya
Cited by
7 articles.
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1. A 100-kV, 100-A/cm2Electron Optical System for the EB-X3 X-Ray Mask Writer;Japanese Journal of Applied Physics;2000-12-30
2. Electron optical system for the x-ray mask writer EB-X3;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999
3. Electron optical system for the x-ray mask writer EB-X2;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-11
4. X-ray mask distortion correction technology using pattern displacement simulator;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-11
5. Improving X-Ray Mask Pattern Placement Accuracy by Correcting Process Distortion in Electron Beam Writing;Japanese Journal of Applied Physics;1995-12-30