X-ray mask distortion correction technology using pattern displacement simulator

Author:

Uchiyama S.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Stress Relaxation of a Patterned Microstructure on a Diaphragm;Journal of Materials Research;2002-07

2. Proximity X-ray and extreme ultraviolet lithography;Comptes Rendus de l'Académie des Sciences - Series IV - Physics;2000-09

3. Membrane-mask distortion correction: Analytical and experimental results;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2000

4. EB-X3: New electron-beam x-ray mask writer;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999

5. X-Ray Mask Fabrication Using New Membrane Process Techniques;Japanese Journal of Applied Physics;1997-12-30

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