Author:
Murooka Ken-ichi,Lim Michael H.,Smith Henry I.
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Multifield sub-5 nm overlay in imprint lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11
2. Temperature distributions to correct distortions in membrane masks;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2004
3. System optimization of membrane mask distortion correction based on Fourier analysis;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2004
4. Photomask and lithography technologies: past 10 years and what will come next;SPIE Proceedings;2003-08-26
5. Adaptive membrane masks;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003