Multifield sub-5 nm overlay in imprint lithography-Reference-Cited by-同舟云学术

Multifield sub-5 nm overlay in imprint lithography

Published:2016-11 Issue:6 Volume:34 Page:061605
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Ajay Paras¹,Cherala Anshuman¹,Yin Bailey A.¹,Moon Euclid E.²,Fabian Pease R.³,Sreenivasan S. V.⁴

Affiliation:

1. NASCENT Engineering Research Center, MER 1.206, JJ Pickle Research Center, University of Texas at Austin, 10100 Burnet Road, Austin, Texas 78758

2. NanoStructures Laboratory Research Laboratory of Electronics, Massachusetts Institute of Technology, 77 Massachusetts Ave., Cambridge, Massachusetts 02139

3. Department of Electrical Engineering, Stanford University, CISX Room 314, Via Ortega, P.O. Box 11089, Stanford, California 94305

4. Department of Mechanical Engineering, University of Texas at Austin, C2200 5.134a, 1 University Station, Austin, Texas 78712

Funder

National Science Foundation (NSF)

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://scitation.aip.org/deliver/fulltext/avs/journal/jvstb/34/6/1.4967371.pdf?itemId=/content/avs/journal/jvstb/34/6/10.1116/1.4967371&mimeType=pdf&containerItemId=content/avs/journal/jvstb

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