Identification of multilayer structures using secondary electron yield curves: effect of native oxide films on EUV-patterned mask inspection
Author:
Affiliation:
1. EUVL Infrastructure Development Ctr., Inc. (Japan)
2. The Univ. of Tokushima (Japan)
Publisher
SPIE
Reference34 articles.
1. Development of extreme ultraviolet mask pattern inspection technology using projection electron beam optics
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1. An analysis of the impact of native oxide, surface contamination and material density on total electron yield in the absence of surface charging effects;Applied Surface Science;2016-10
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