Scatterometry-based process control for nanoimprint lithography-Reference-Cited by-同舟云学术

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Scatterometry-based process control for nanoimprint lithography

Published:2016-03-08 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Asano Masafumi¹,Tsuda Hirotaka¹,Komori Motofumi¹,Matsuki Kazuto¹,Abe Hideaki¹,Jung Woo-Yung²

Affiliation:

1. Toshiba Corp. (Japan)

2. SK hynix, Inc. (Korea, Republic of)

Publisher

SPIE

Reference7 articles.

1. High throughput jet and flash imprint lithography for advanced semiconductor memory;Khusnatdinov,2014

2. Nanoimprint system development and status for high volume semiconductor manufacturing;Takeishi,2015

3. Application of optical CD metrology for alternative lithography;Asano,2013

4. Hard disk drive thin film head manufactured using nanoimprint lithography;Sullivan,2014

5. Scatterometry sensitivity for NIL process;Miyakawa,2011

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Process control technology for nanoimprint lithography;Novel Patterning Technologies 2018;2018-03-23

2. Metrology and inspection required for next generation lithography;Japanese Journal of Applied Physics;2017-04-24

3. Required metrology and inspection for nanoimprint lithography;SPIE Proceedings;2017-03-28

4. Scatterometry for nanoimprint lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11

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