Enabling on-device and target-free overlay measurement from CD-SEM contours-Reference-Cited by-同舟云学术

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Enabling on-device and target-free overlay measurement from CD-SEM contours

Published:2022-05-26 Issue: Volume: Page:
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Container-title:Metrology, Inspection, and Process Control XXXVI
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Author:

Bourguignon Thibaut,Bouyssou Regis,Pradelles Jonathan,Bérard-Bergery Sébastien,Le-Gratiet Bertrand,Bange Romain,Schuch Nivea G.,Figueiro Thiago,Possémé Nicolas

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Small angle x-ray scattering overlay metrology for advanced nodes;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

2. Self-supervised deep learning neural network for CD-SEM image denoising using reduced dataset;Metrology, Inspection, and Process Control XXXVII;2023-04-27

3. Can remote SEM contours be used to match various SEM tools in fabs?;Metrology, Inspection, and Process Control XXXVII;2023-04-27

4. High-spatial frequency on-device overlay characterization using CD-SEM contours;Metrology, Inspection, and Process Control XXXVII;2023-04-27

5. Contour based on-device overlay metrology assessment using synthetic SEM images;37th European Mask and Lithography Conference;2022-11-01

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