Author:
Bourguignon Thibaut,Le-Gratiet Bertrand,Pradelles Jonathan,Bérard-Bergerie Sébastien,Rademaker Guido,Possémé Nicolas
Reference9 articles.
1. On-product overlay solutions for DUV and EUV mixscanner usage in an EPE-driven patterning world;Slotboom,2022
2. Investigating process variability at ppm level using advanced massive eBeam CD metrology and contour analysis;Le-Gratiet,2019
3. Effect of etch pattern transfer on local overlay (OVL) margin in 28nm gate integration.;Ros,2014
4. A novel projection lens manipulator for high frequent overlay tuning;Pollak,2020
5. On-scanner high-spatial-frequency overlay control using a distortion manipulator;Klinkhamer,2022