1. Mbmw-101: World’s 1st high-throughput multi-beam mask writer;Klein,2016
2. Optimal feature vector design for computational lithography;Shi,2018
3. Machine learning based wafer defect detection
4. Comparing raw vs. manhattan ilt shape efficacy on epe and process window;Buck,2016
5. Controlling bridging and pinching with pixel-based mask for inverse lithography;Kobelkov,2016