Comparison between e-beam direct write and immersion lithography for 20nm node-Reference-Cited by-同舟云学术

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Comparison between e-beam direct write and immersion lithography for 20nm node

Published:2015-03-19 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies VII
language:
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Author:

Brandt Pieter,Sardana Charu,Ibbotson Dale,Wieland Marco,Fay Aurélien

Publisher

SPIE

Reference7 articles.

1. Performance validation of MAPPER’s FLX-1200;Wieland,2015

2. Roadmap to sub-nanometer OPC model accuracy;Sturtevant,2012

3. Demonstration of electronic design automation flow for massively parallel e-beam lithography

4. Corrections to proximity effects in electron beam lithography. I. Theory

5. Matching of beams on the MAPPER MATRIX tool: a simulation study;Belledent,2013

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 浸没式光刻机浸液系统污染控制研究现状及进展;Laser & Optoelectronics Progress;2022

2. Recent development status of rinse material for EUV lithography;SPIE Proceedings;2017-05-05

3. Novel Rinse Material to Improve EUV Lithography Performance;Journal of Photopolymer Science and Technology;2016

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