1. Towards Production Ready Processing with a State-of-the-art EUV cluster;Petrillo,2015
2. Directed self-assembly of top coat-free, integration-friendly high-χ block copolymers;Hirahara,2015
3. Comparison between e-beam direct write and immersion lithography for 20nm node;Brandt,2015
4. SEMATECH’s Cycles of Learning Test for EUV Photoresist and its applications for Process Improvement;Chun,2014
5. Performance of one hundred watt HVM LPP-EUV Source;Mizoguchi,2015