1. Latest Cluster Performance for EUV Lithography;Shite,2012
2. Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers
3. Novel Rinse Material to Improve EUV Lithography Performance;Yamamoto;Journal of Photopolymer Science and Technology,2016
4. Recent development status of rinse material for EUV lithography;Yamamoto,2017
5. The defect mitigation on EUV stack by track based technology;Shibata,2021