High-resolution EUV Microstepper tool for resist testing and technology evaluation-Reference-Cited by-同舟云学术

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High-resolution EUV Microstepper tool for resist testing and technology evaluation

Published:2004-09-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:High-Power Laser Ablation V
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Author:

Brunton Adam,Cashmore Julian S.,Elbourn Peter,Elliner Graeme,Gower Malcolm C.,Grunewald Philipp,Harman M.,Hough S.,McEntee N.,Mundair S.,Rees D.,Richards P.,Truffert V.,Wallhead Ian,Whitfield Michael D.

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET);SPIE Proceedings;2014-04-17

2. Projection optics for EUVL micro-field exposure tools with 0.5 NA;SPIE Proceedings;2014-04-17

3. Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5;Extreme Ultraviolet (EUV) Lithography IV;2013-04-01

4. Effect of post-etch cleaning on Ru-capped extreme ultraviolet lithography photomask;Applied Surface Science;2012-03

5. Next-generation lithography for 22 and 16 nm technology nodes and beyond;Science China Information Sciences;2011-05

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