Reworkable spin-on trilayer materials: optimization of rework process and solutions for manufacturability-Reference-Cited by-同舟云学术

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Reworkable spin-on trilayer materials: optimization of rework process and solutions for manufacturability

Published:2009-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Materials and Processing Technology XXVI
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Author:

Zhang Ruzhi,Timko Allen G.,Zook John,Wei Yayi,Pylneva Lyudmila,Yi Yi,Li Chenghong,Wu Hengpeng,Rahman Dalil,McKenzie Douglas S.,Anyadiegwu Clement,Lu Ping-Hung,Neisser Mark,Dammel Ralph R.,Bradbury Ron,Lee Timothy

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spin-on metal oxide materials with high etch selectivity and wet strippability;SPIE Proceedings;2016-03-25

2. Spin-on Metal Oxides and Their Applications for Next Generation Lithography;Journal of Photopolymer Science and Technology;2016

3. Progress in Spin-on Hard Mask Materials for Advanced Lithography;Journal of Photopolymer Science and Technology;2014

4. Effects of Plasma and Wet Processes on Si-Rich Anti-Reflective Coating to Address Selective Trilayer Rework for Sub-20nm Technology Nodes;ECS Transactions;2013-08-31

5. New spin-on metal hardmask materials for lithography processes;SPIE Proceedings;2013-03-29

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