Progress in Spin-on Hard Mask Materials for Advanced Lithography-Reference-Cited by-同舟云学术

Progress in Spin-on Hard Mask Materials for Advanced Lithography

Published:2014 Issue:4 Volume:27 Page:503-509
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Padmanaban Munirathna,Cho JoonYeon,Kudo Takanori,Rahman Dalil,Yao Huirong,McKenzie Douglas,Dioses Alberto,Mullen Salem,Wolfer Elizabeth,Yamamoto Kazuma,Cao Yi,Her YoungJun

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/27/4/27_503/_pdf

Reference13 articles.

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2. [2] C. Oh, J.K. Lee, M.S. Kim, K.H. Yoon, H.S. Cheon, N. Tokareva, J.Y. Song, J.S. Kim, T.W. Chang, Proc. SPIE 6923 (2008) 69232V.

3. [3] H.S. Cheon, K.H. Yoon, M.S. Kim, S.B. Oh, J.Y. Song, N. Tokareva, J.S. Kim, T. Chang, Proc. SPIE 7140 (2008) 71402R.

4. [4] H.S. Cheon, K.H. Yoon, M.S. Kim, S.B. Oh, J.Y. Song, N. Tokareva, J.S. Kim, T. Chang, Proc. SPIE 7273 (2009) 727310.

5. [5] Y. Wei, M. Glodde, H. Yusuff, M. Lawson, S-Y. Chang, K-S. Yoon, C-H. Wu, M. Kelling, Proc. SPIE 7972 (2011) 79722L.

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