SEMATECH's cycles of learning test for EUV photoresist and its applications for process improvement-Reference-Cited by-同舟云学术

SEMATECH's cycles of learning test for EUV photoresist and its applications for process improvement

Published:2014-04-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Chun Jun Sung¹,Jen Shih-Hui¹,Petrillo Karen¹,Montgomery Cecilia¹,Ashworth Dominic¹,Neisser Mark¹,Saito Takashi²,Huli Lior²,Hetzer David²

Affiliation:

1. SEMATECH Inc. (United States)

2. TEL Technology Ctr., America, LLC (United States)

Publisher

SPIE

Reference18 articles.

1. Jun Sung Chun, Shiu-Hui Jen, Karen Petrillo, Dominic Ashworth, Mark Neisser, Takashi Saito, Lior Huli, Metz Andrew, “Enabling robust EUV lithography for NXE3300 applications : 2013 SEMATECH’s Cycles Of Learning Project Combined with TEL” EUV Symposium, Toyama, Japan October 2013

2. Resist process applications to improve EUV patterning;Petrillo,2013

3. A. M. Goethals, F. Van Roey, K. Hosokawa, R. Hoefnagels, A. Niroomand, Ph. Foubert, “Assessment of EUV Resist Performance f or sub-22nm HP lines and 26nm contacts on NXE3100,” EUVL Symposium, 2012.

4. Kyoungyong Cho, Karen Petrillo, Cecilia Montgomery, Alexander Friz, Yu-Jen Fan, Chandra Sarma, Dominic Ashworth, Mark Neisser, “EUV resists patterning results at SEMATECH,” EUVL Symposium, 2012.

5. H. F. Hoefnagels, S. Wang, C. Verspaget, R. Mass, T. Wallow, D. Civay, A. Fumar-Pici, “EUV resist performance on 22 nm CH and on 22nm L/S,” EUVL Symposium, 2012.

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