1. First results of outgas resist family test and correlation between outgas specifications and EUV resist development
2. Enabling robust EUV lithography for NXE:3300 applications,;Chun,2013
3. SEMATECH's cycles of learning test for EUV photoresist and its applications for process improvement,;Chun,2014
4. Evaluation of novel processing approaches to improve extreme ultraviolet (EUV) photoresist pattern quality,;Montgomery,2015
5. The patterning center of excellence (CoE): an evolving lithographic enablement model,;Montgomery,2015