First results of outgas resist family test and correlation between outgas specifications and EUV resist development-Reference-Cited by-同舟云学术

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First results of outgas resist family test and correlation between outgas specifications and EUV resist development

Published:2015-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Fan Yu-Jen,Maruyama Ken,Ayothi Ramakrishnan,Naruoka Takehiko,Chakraborty Tonmoy,Ashworth Dominic,Chun Jun Sung,Montgomery Cecilia,Jen Shih-Hui,Neisser Mark,Cummings Kevin

Publisher

SPIE

Reference10 articles.

1. Direct measurement of carbon contamination topography on patterned EUV masks;Fan,2014

2. ASML resist outgas testing update;Harned,2014

3. SEMATECH outgas testing update;Fan,2014

4. http://www.euvl.com

5. Resist outgassing contamination growth results using both photon and electron exposures;Denbeaux,2013

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optimization of chemically amplified resist formulation based on simple random sampling and kernel density estimation;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-05-15

2. Benchmarking study of EUV resists for NXE:3300B;Extreme Ultraviolet (EUV) Lithography VII;2016-03-18

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