Adopting curvilinear shapes for production ILT: challenges and opportunities-Reference-Cited by-同舟云学术

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Adopting curvilinear shapes for production ILT: challenges and opportunities

Published:2019-10-10 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology 2019
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Author:

Pearman Ryan,Ungar P. Jeffrey,Shirali Nagesh,Shendre Abishek,Niewczas Mariusz,Pang Leo,Fujimura Aki

Publisher

SPIE

Reference8 articles.

1. E-beam shot count estimation at 32 nm HP and beyond;Choi,2009

2. Enhancing ILT process window using curvilinear mask patterning: dual mask-wafer simulation;Pearman,2019

3. PMJ paper

4. Future mask writers requirements for the sub-10nm node era;Chandramouli,2012

5. 2018 mask makers’ survey conducted by the eBeam Initiative;Fujimura,2018

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Inverse Lithography with Structured Sub-Resolution Assist Features;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10

2. You do not need 1 nm contours for curvilinear shapes: pixel-based computing is the answer;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-24

3. Improvements on pattern fidelity at high curvature region of curvilinear mask with a novel method of MPC;Photomask Technology 2023;2023-11-21

4. Implicit function characterization of the curvilinear mask to realize parametric optical proximity correction with a neighborhood parallel tabu search;Applied Optics;2023-06-12

5. Breakthrough curvilinear ILT enabled by multi-beam mask writing;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-11-17

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