Replicating characteristics by SR lithography
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SPIE
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Improvement of resolution in x-ray lithography by reducing secondary electron blur;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2004
2. Effect of secondary electron from the substrate in x-ray lithography using harder radiation spectra;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2001
3. Resist profile characteristics caused by photoelectron and Auger electron blur at the resist–tungsten substrate interface in 100 nm proximity x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2000
4. Design of a beamline for soft and deep lithography on third generation synchrotron radiation source;Review of Scientific Instruments;1999-03
5. A superconducting magnet for a compact synchrotron radiation ring;Electrical Engineering in Japan;1999-01-15
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