Design of a beamline for soft and deep lithography on third generation synchrotron radiation source
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1149640
Reference18 articles.
1. Novel single mirror condenser for x-ray lithography beam lines
2. Replicating characteristics by SR lithography
3. High-speed positive x-ray resist suitable for precise replication of sub-0.25-μm features
4. High-performance multilevel blazed x-ray microscopy Fresnel zone plates: Fabricated using x-ray lithography
5. Fabrication of photonic crystals by deep x-ray lithography
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