Novel Hybrid Organic–Inorganic Spin‐on Resist for Electron‐ or Photon‐Based Nanolithography with Outstanding Resistance to Dry Etching
Author:
Affiliation:
1. Industrial Engineering Department and INSTM Via Marzolo 9 35131 Padova Italy
2. CNR‐IOM, Laboratorio TASC LILIT Beam Line Basovizza, S.S 14 Km 163.5 34149 Trieste Italy
Funder
CARIPARO
CARIPLO
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/adma.201301555
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