Resists for Helium Ion Beam Lithography: Recent Advances
Author:
Affiliation:
1. School of Basic Sciences (SBS), Indian Institute of Technology (IIT), Mandi, Himachal Pradesh 175005, India
2. School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT), Mandi, Himachal Pradesh 175005, India
Funder
Uchchyatar Avishkar Yojona
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acsaelm.0c00627
Reference84 articles.
1. Advances in Patterning Materials for 193 nm Immersion Lithography
2. Lithographic Imaging Techniques for the Formation of Nanoscopic Features
3. Sub-10 nm Electron Beam Nanolithography Using Spin-Coatable TiO2 Resists
4. TiO2 patterning using electro-hydrodynamic lithography
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