Author:
Seo Younghun,Lee Changhwan,Seo Yongduk,Kim Ohyun,Noh Hyunpil,Kim Heesang
Cited by
3 articles.
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1. Improvement of resolution in x-ray lithography by reducing secondary electron blur;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2004
2. Effect of secondary electron from the substrate in x-ray lithography using harder radiation spectra;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2001
3. Monte Carlo simulation of substrate photoelectrons in hard X-ray lithography and the effect of buffer layer;Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)