Programmed line width roughness metrology by multitechniques approach-Reference-Cited by-同舟云学术

Programmed line width roughness metrology by multitechniques approach

Published:2018-07-31 Issue:04 Volume:17 Page:1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Reche Jérôme¹,Besacier Maxime²,Gergaud Patrice¹,Blancquaert Yoann¹,Freychet Guillaume³,Labbaye Thibault¹

Affiliation:

1. Université Grenoble Alpes, CEA, LETI, DTSI, Grenoble

2. Université Grenoble Alpes, CNRS, CEA-LETI Minatec, LTM, Grenoble

3. Lawrence Berkeley National Laboratory, Advanced Light Source, Berkeley, California

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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