Developmental framework of line edge roughness reference standards for next-generation functional micro-/nanostructures

Author:

Kizu RyosukeORCID,Misumi Ichiko,Hirai Akiko,Gonda Satoshi,Takahashi SatoruORCID

Funder

Japan Society for the Promotion of Science

Ministry of Education, Culture, Sports, Science and Technology

National Institute of Advanced Industrial Science and Technology

Publisher

Elsevier BV

Subject

General Engineering

Reference28 articles.

1. Metrology capabilities and needs for 7 nm and 5 nm logic nodes;Bunday;Proc SPIE,2017

2. Need for LWR metrology standardization: the imec roughness protocol;Lorusso;J Nanolithogr MEMS, MOEMS,2018

3. Ultra-smooth silicon nitride waveguides based on the Damascene reflow process: fabrication and loss origins;Pfeiffer;Optica,2018

4. Are slot and sub-wavelength grating waveguides better than strip waveguides for sensing?;Kita;Optica,2018

5. Roughness study on line and space patterning with chemo-epitaxy directed self-assembly;Suh;Proc SPIE,2020

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