Progress in nanoimprint wafer and mask systems for high volume semiconductor manufacturing-Reference-Cited by-同舟云学术

Progress in nanoimprint wafer and mask systems for high volume semiconductor manufacturing

Published:2017-10-16 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology
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Author:

Hiura Mitsuru,Hayashi Tatsuya,Kimura Atsushi,Suzaki Yoshio,Imoto Kohei,Choi Jin,Morohoshi Hiroshi

Publisher

SPIE

Reference22 articles.

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2. Pattern transfer to silicon by microcontact printing and RIE

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4. M. Colburn, T. Bailey, B. J. Choi, J. G. Ekerdt, S. V. Sreenivasan, Solid State Technology, 67, June 2001.

5. Template fabrication schemes for step and flash imprint lithography

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